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The process of formation of amorphous Ni-P Layers made by electroless deposition

Szász, András and Kojnok, J. and Kertész, L. and Paál, Zoltán and Hegedűs, Z. (1984) The process of formation of amorphous Ni-P Layers made by electroless deposition. THIN SOLID FILMS, 116 (1-3). pp. 279-286. ISSN 0040-6090

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Abstract

The composition, electronic states and structure of thin Ni-P layers deposited by the electroless method were studied by soft X-ray emission spectroscopy, differential thermal analysis, secondary ion emission, X-ray diffraction and auxiliary microscopic investigations. The first centres of the layer consisted of pure crystalline nickel nuclei. With increasing growth, the deviation from crystallinity increased, with continous changes in the composition. Also, diffusion processes take place transporting aluminium and silicon from the underlying substrate. © 1984.

Item Type: Article
Subjects: Q Science / természettudomány > QC Physics / fizika
Q Science / természettudomány > QC Physics / fizika > QC06 Physics of condensed matter / szilárdtestfizika
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 26 Aug 2013 12:36
Last Modified: 26 Aug 2013 12:36
URI: http://real.mtak.hu/id/eprint/6300

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