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CHEMICAL MECHANISMS IN ELECTROLESS DEPOSITION - A STUDY ON THE ROLE OF HYDROGEN IN LAYER FORMATION

Szász, András and FABIAN, D. J. and Paál, Zoltán and Kojnok, J. (1988) CHEMICAL MECHANISMS IN ELECTROLESS DEPOSITION - A STUDY ON THE ROLE OF HYDROGEN IN LAYER FORMATION. JOURNAL OF NON-CRYSTALLINE SOLIDS, 103 (1). pp. 21-27. ISSN 0022-3093

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Abstract

Mechanisms of formation of electroless NiP amorphous alloys have been studied with special emphasis on the role of hydrogen. It is proposed that hydrogen atoms produced during layer nucleation and growth are occlded by the deposit during the process of formation and that they have an important role in stabilizing the amorphous structure. The hydrogen may also play a part in the whole autocatalytic process. The hydrogen evolution is accompanied by incorporation of phosphorus, which to some extent takes over the role of the metalloid necessary to stabilize the amorphous structure. Airation of the electroless bath is found to decrease hydrogen liberation and to make the layers more uniform, but causes their thermal stability to decrease. Possible explanations for these effects are discussed. © 1988.

Item Type: Article
Subjects: Q Science / természettudomány > QC Physics / fizika
Q Science / természettudomány > QD Chemistry / kémia
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 27 Aug 2013 07:04
Last Modified: 27 Aug 2013 07:04
URI: http://real.mtak.hu/id/eprint/6309

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