Photorefractive damage resistance threshold in stoichiometric LiNbO_3:Zr crystals

Kovács, László and Szaller, Zsuzsanna and Lengyel, Krisztián and Péter, Ágnes and Hajdara, Ivett and Mandula, Gábor and Pálfalvi, László and Hebling, János (2013) Photorefractive damage resistance threshold in stoichiometric LiNbO_3:Zr crystals. Optics Letters, 38 (15). pp. 2861-2864. ISSN 0146-9592

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Several optical methods including ultraviolet absorption, infrared absorption of the hydroxyl ions, Raman spectroscopy, and the Z-scan method have been used to determine the damage resistance threshold in 0–0.72 mol. % Zr-containing, flux-grown, nearly stoichiometric LiNbO3 single crystals. All spectroscopical methods used indicate that samples containing at least ≈0.085 mol: % Zr in the crystal are above the threshold while Z-scan data locate the photorefractive damage threshold between 0.085 and 0.314 mol. % Zr.

Item Type: Article
Subjects: Q Science / természettudomány > QC Physics / fizika > QC02 Optics / fénytan
Depositing User: Gabor Almasi
Date Deposited: 07 Feb 2014 08:49
Last Modified: 07 Feb 2014 08:59

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