Kun, Péter and Fülöp, Bálint and Dobrik, Gergely and Nemes-Incze, Péter and Lukács, István Endre and Csonka, Szabolcs and Hwang, Chanyong and Tapasztó, Levente (2020) Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography. NPJ 2D MATERIALS AND APPLICATIONS, 4. pp. 1-6. ISSN 2397-7132
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s41699-020-00177-x.pdf Available under License Creative Commons Attribution. Download (1MB) | Preview |
Official URL: https://doi.org/10.1038/s41699-020-00177-x
| Item Type: | Article |
|---|---|
| Subjects: | Q Science / természettudomány > QD Chemistry / kémia > QD02 Physical chemistry / fizikai kémia |
| SWORD Depositor: | MTMT SWORD |
| Depositing User: | MTMT SWORD |
| Date Deposited: | 06 Jan 2021 09:24 |
| Last Modified: | 06 Jan 2021 09:24 |
| URI: | http://real.mtak.hu/id/eprint/119174 |
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