Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films

Tucker, Mark D. and Czigány, Zsolt and Broitman, Esteban and Hultman, Lars and Rosen, Johanna and Naslund, Lars-Ake (2014) Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films. JOURNAL OF APPLIED PHYSICS, 115 (14). 144312/1-144312/8. ISSN 0021-8979


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Carbon and carbon nitride films (CNx, 0 ≤ x ≤ 0.26) were deposited by filtered pulsed cathodic arc and were investigated using transmission electron microscopy and X-ray photoelectron spectroscopy. A "fullerene-like" (FL) structure of ordered graphitic planes, similar to that of magnetron sputtered FL-CNx films, was observed in films deposited at 175 °C and above, with N2 pressures of 0 and 0.5 mTorr. Higher substrate temperatures and significant nitrogen incorporation are required to produce similar FL structure by sputtering, which may, at least in part, be explained by the high ion charge states and ion energies characteristic of arc deposition. A gradual transition from majority sp3-hybridized films to sp2 films was observed with increasing substrate temperature. High elastic recovery, an attractive characteristic mechanical property of FL-CNx films, is evident in arc-deposited films both with and without nitrogen content, and both with and without FL structure. © 2014 AIP Publishing LLC.

Item Type: Article
Uncontrolled Keywords: Carbon films; Substrate temperature; Pulsed cathodic arc; Nitrogen incorporation; Nitrogen content; Graphitic planes; Gradual transition; Elastic recovery; CARBON NITRIDE FILMS; X ray photoelectron spectroscopy; transmission electron microscopy; PHOTOELECTRONS; Nitrogen; mechanical properties; Magnetrons; FULLERENES; DEPOSITION; Carbon nitride
Subjects: Q Science / természettudomány > QC Physics / fizika
Q Science / természettudomány > QC Physics / fizika > QC05 Physical nature of matter / részecskefizika
Depositing User: MTMT SWORD
Date Deposited: 16 May 2014 09:21
Last Modified: 17 May 2014 03:36

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