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VO2 Layers with High Resistive Switching Ratio by Atomic Layer Deposition

Baji, Zsófia and Pósa, László and Molnár, György and Szabó, Zoltán and Volom, Mátyás and Volk, János (2023) VO2 Layers with High Resistive Switching Ratio by Atomic Layer Deposition. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING : FUNCTIONAL MATERIALS FOR (OPTO)ELECTRONICS, SENSORS, DETECTORS, AND GREEN ENERGY, 162. pp. 1-9. ISSN 1369-8001 (print); 1873-4081 (online)

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Item Type: Article
Subjects: Q Science / természettudomány > QD Chemistry / kémia > QD02 Physical chemistry / fizikai kémia
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 22 May 2023 07:15
Last Modified: 22 Sep 2023 12:45
URI: http://real.mtak.hu/id/eprint/165696

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