The chemical resistance of nano-sized SiC rich composite coating

Gurbán, Sándor and Kotysh, László and Pongrácz, Anita and Sulyok, Attila and Tóth, Attila Lajos and Vázsonyi, Éva and Menyhárd, Miklós (2014) The chemical resistance of nano-sized SiC rich composite coating. SURFACE & COATINGS TECHNOLOGY, in pre. in press. ISSN 0257-8972


Download (786kB) | Preview


Abstract 30 keV Ga+ implantation was applied to a nominally C(20 nm)/Si(20 nm)/C(20 nm)/Si(20 nm)/C(20 nm)/Si substrate multilayer system. Due to the irradiation intermixing occurred and a layer containing C, Si, Ga and (amorphous) SiC was obtained. The thickness (7–30 nm) and composition of the layer depended on the fluence of irradiation. The chemical resistance of the layer was tested by applying microwave oxidation and various polysilicon etchants and was found to be excellent if the SiC concentration was above 20%. Using an etchant with an etching rate of about 100 nm/s for poly-Si during 10 s had not affected the integrity of the intermixed region with a thickness of 10 nm; only some defects appeared. With a further increase of the etching time the size of defects increased resulting in inhomogeneous layer removal. The in-depth composition of non-defective region that remained on the surface was determined by AES depth profiling, which revealed that the intermixed layer did not change during the harsh etching except the removal of its thin surface layer containing less than 20% SiC. The etching rate of the intermixed layer is orders of magnitude lower than that for poly-Si.

Item Type: Article
Uncontrolled Keywords: SiC rich nano coating; Ion mixing; Composite coating; SiC nano particles; Chemical resistance of nano coating
Subjects: Q Science / természettudomány > QD Chemistry / kémia > QD02 Physical chemistry / fizikai kémia
Depositing User: MTMT SWORD
Date Deposited: 04 Dec 2014 10:39
Last Modified: 04 Dec 2014 10:39

Actions (login required)

Edit Item Edit Item