An, H. and Wang, J. and Szívós, János and Harumoto, T. and Sannomiya, T. and Sáfrán, György (2015) Perpendicular coercivity enhancement of CoPt/TiN films by nitrogen incorporation during deposition. JOURNAL OF APPLIED PHYSICS, 118 (20). pp. 1-5. ISSN 0021-8979
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Abstract
The effect of N incorporation on the structure and magnetic properties of CoPt thin films deposited on glass substrates with TiN seed layers has been investigated. During the deposition of CoPt, introducing 20% N2 into Ar atmosphere promotes the (001) texture and enhances the perpendicular coercivity of CoPt film compared with the film deposited in pure Ar and post-annealed under the same conditions. From the in situ x-ray diffraction results, it is confirmed that N incorporation expands the lattice parameter of CoPt, which favors the epitaxial growth of CoPt on TiN. During the post-annealing process, N releases from CoPt film and promotes the L10 ordering transformation of CoPt. © 2015 AIP Publishing LLC.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | thin films; Post annealing; Perpendicular coercivity; Order transformation; Nitrogen incorporation; N incorporation; In-situ X-ray diffraction; Glass substrates; CoPt thin films; X ray diffraction; Titanium nitride; Titanium compounds; Substrates; DEPOSITION; coercive force; annealing |
| Subjects: | Q Science / természettudomány > QD Chemistry / kémia |
| SWORD Depositor: | MTMT SWORD |
| Depositing User: | MTMT SWORD |
| Date Deposited: | 08 Jan 2016 15:12 |
| Last Modified: | 08 Jan 2016 15:12 |
| URI: | http://real.mtak.hu/id/eprint/31997 |
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