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Spectroellipsometric detection of silicon substrate damage caused by radiofrequency sputtering of niobium oxide

Lohner, Tivadar and Serényi, Miklós and Szilágyi, Edit and Zolnai, Zsolt and Czigány, Zsolt and Nguyen Quoc, Khánh and Petrik, Péter and Fried, Miklós (2016) Spectroellipsometric detection of silicon substrate damage caused by radiofrequency sputtering of niobium oxide. APPLIED SURFACE SCIENCE. pp. 1-30. ISSN 0169-4332

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Item Type: Article
Uncontrolled Keywords: electron microscopy; RUTHERFORD BACKSCATTERING; Ellipsometry; DAMAGE; sputtering
Subjects: Q Science / természettudomány > QC Physics / fizika
Q Science / természettudomány > QD Chemistry / kémia > QD02 Physical chemistry / fizikai kémia
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 01 Dec 2016 09:18
Last Modified: 01 Dec 2016 09:18
URI: http://real.mtak.hu/id/eprint/42657

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