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Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films

Ehiasarian, A. P. and Vetushka, A. and Gonzalvo, Y. Aranda and Sáfrán, György and Székely, Lajos and Barna B., Péter (2011) Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films. JOURNAL OF APPLIED PHYSICS, 109 (10). ISSN 0021-8979

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Item Type: Article
Subjects: Q Science / természettudomány > QC Physics / fizika
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 14 Feb 2019 09:54
Last Modified: 14 Feb 2019 09:54
URI: http://real.mtak.hu/id/eprint/91290

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