Dodony, Erzsébet and Radnóczi, György Z. and Dódony, István (2019) Low temperature formation of copper rich silicides. Intermetallics, 107. pp. 108-115. ISSN 0966-9795
|
Text
Dodony_META6412_edited_201901001582785819.pdf Download (9MB) | Preview |
Abstract
The reactions of copper and amorphous silicon were studied by in-situ transmission electron microscopy up to 500 degrees C. Only the Cu76Si24-eta phase and the Cu82Si18-delta phase formed at this temperature. The crystal structure of the dominating Cu76Si24 changed, by the elapsed time after heating. The Cu-Si ordering resulted in different supercells, built up by topologically identical subcells with different site occupancies and arrangement. Two modulated crystal structures were solved based on diffraction data and HRTEM images.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Copper-silicide; Crystal structure; Modulation; Electron crystallography |
| Subjects: | Q Science / természettudomány > QD Chemistry / kémia > QD02 Physical chemistry / fizikai kémia |
| SWORD Depositor: | MTMT SWORD |
| Depositing User: | MTMT SWORD |
| Date Deposited: | 09 Apr 2019 08:48 |
| Last Modified: | 09 Apr 2019 08:48 |
| URI: | http://real.mtak.hu/id/eprint/92633 |
Actions (login required)
 |
Edit Item |
