Photorefractive damage resistance threshold in stoichiometric LiNbO_3:Zr crystals

Kovács, László and Szaller, Zsuzsanna and Lengyel, Krisztián and Péter, Ágnes and Hajdara, Ivett and Mandula, Gábor and Pálfalvi, László and Hebling, János (2013) Photorefractive damage resistance threshold in stoichiometric LiNbO_3:Zr crystals. Optics Letters, 38 (15). pp. 2861-2864. ISSN 0146-9592

Preview

Text ol_Palfalvi_2013.pdf - Published Version Download (309kB) | Preview

Abstract

Several optical methods including ultraviolet absorption, infrared absorption of the hydroxyl ions, Raman spectroscopy, and the Z-scan method have been used to determine the damage resistance threshold in 0–0.72 mol. % Zr-containing, flux-grown, nearly stoichiometric LiNbO3 single crystals. All spectroscopical methods used indicate that samples containing at least ≈0.085 mol: % Zr in the crystal are above the threshold while Z-scan data locate the photorefractive damage threshold between 0.085 and 0.314 mol. % Zr.

Actions (login required)

Edit Item