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Application of sputtered ceramic TiC/a: C thin films with different structures by changing the deposition parameters

Balázsi, Katalin and Balázsi, Csaba (2022) Application of sputtered ceramic TiC/a: C thin films with different structures by changing the deposition parameters. INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY, 19 (2). pp. 753-761. ISSN 1546-542X

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Abstract

Titanium carbide-based thin films have been produced by DC magnetron sputtering. It was demonstrated that the same technology with changing of the deposition parameters, such as deposition temperature or power of Ti target, resulted in the preparation of TiC/a:C thin films with various structures. The structure of thin films and volume fraction of amorphous and crystal phases were precisely tailored by the control of deposition parameters. These ceramic nanocomposite TiC/a:C thin films according to their various structures, hence, their different mechanical, tribological, or wetting parameters can be used in wide range of applications.

Item Type: Article
Subjects: Q Science / természettudomány > QC Physics / fizika
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 12 May 2022 12:53
Last Modified: 12 May 2022 12:53
URI: http://real.mtak.hu/id/eprint/142721

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