Direct Atomic Layer Deposition of Ultra-Thin Al2O3 and HfO2 Films on Gold-Supported Monolayer MoS2

Schilirò, E. and Panasci, S. E. and Mio, A. M. and Nicotra, G. and Agnello, S. and Pécz, B. and Radnóczi, Gy. Z. (2023) Direct Atomic Layer Deposition of Ultra-Thin Al2O3 and HfO2 Films on Gold-Supported Monolayer MoS2. APPLIED SURFACE SCIENCE : A JOURNAL DEVOTED TO APPLIED PHYSICS AND CHEMISTRY OF SURFACES AND INTERFACES, 630. pp. 1-11. ISSN 0169-4332 (print); 1873-5584 (online)

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Official URL: https://doi.org/10.1016/j.apsusc.2023.157476

Item Type:	Article
Subjects:	Q Science / természettudomány > QD Chemistry / kémia > QD02 Physical chemistry / fizikai kémia
SWORD Depositor:	MTMT SWORD
Depositing User:	MTMT SWORD
Date Deposited:	22 May 2023 11:54
Last Modified:	22 May 2023 11:54
URI:	http://real.mtak.hu/id/eprint/165720

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