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Tilt Angle and Dose Rate Monitoring of Low Energy Ion Implantation Processes with Photomodulated Reflectance Measurement : AM: Advanced Metrology

Pongrácz, A. and Szívós, J. and Ujhelyi, F. and Zolnai, Zs. and Sepsi, Ö. and Kun, Á. and Nádudvari, Gy. (2020) Tilt Angle and Dose Rate Monitoring of Low Energy Ion Implantation Processes with Photomodulated Reflectance Measurement : AM: Advanced Metrology. PROCEEDINGS OF THE 2020 31ST ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE (ASMC). No.-19976691. ISSN 2376-6697 (In Press)

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Item Type: Article
Subjects: T Technology / alkalmazott, műszaki tudományok > TA Engineering (General). Civil engineering (General) / általános mérnöki tudományok
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 20 Nov 2023 14:51
Last Modified: 20 Nov 2023 14:51
URI: http://real.mtak.hu/id/eprint/180392

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