Characterization of thin MoO3 films formed by RF and DC-magnetron reactive sputtering for gas sensor applications

Yordanov, R. and Boyadjiev, Stefan Ivanov and Georgieva, V. and Vergov, L. (2014) Characterization of thin MoO3 films formed by RF and DC-magnetron reactive sputtering for gas sensor applications. JOURNAL OF PHYSICS-CONFERENCE SERIES, 514. 012040. ISSN 1742-6588

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Abstract

The present work discusses a technology f or deposition and characterization of thin molybdenum oxide (MoO x , MoO 3 ) films studied for gas sensor applications. T he samples were produced by reactive radio - frequency (RF) and direct c urrent (DC) magnetron sputtering. The composition and microstructure of the films were studied by XPS , XRD and Raman spectroscopy, the morphology , using high resolution SEM. T he research was focused on the sensing properties of the sputtered thin MoO 3 films. Highly sensitive gas sensor s were implemented by depositing films of various thicknesses on quartz resonators. Making use of the quartz crystal microbalance (QCM) method , the se sensors we re capable of detect ing chan ges in the molecular range. Prototype QCM structures with thin MoO 3 films were tested for sensitivity to NH 3 and NO 2 . E ven in as - deposited state and without heating the substrates, these films show ed good sensitivity . Moreover , no a dditional thermal treatment is necessary, which makes the production of such QCM gas sensor s simple and cost - effective, as it is fu lly compatible wit h the technology for producing t he initial resonator . Т he films are sensitive at room temperature and can reg ister concentrations as low as 50 ppm . The sorption is fully reversible , the films are stable and capable of long - term measuremen ts.

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