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Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor–insulator–semiconductor heterojunction solar cell

Talkenberg, Florian and Illhardt, Stefan and Radnóczi, György Zoltán and Pécz, Béla and Schmidl, Gabriele (2015) Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor–insulator–semiconductor heterojunction solar cell. JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A-VACUUM SURFACES AND FILMS, 33. 041101. ISSN 0734-2101

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Item Type: Article
Subjects: Q Science / természettudomány > QC Physics / fizika
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 08 Jun 2015 08:50
Last Modified: 08 Jun 2015 08:50
URI: http://real.mtak.hu/id/eprint/24547

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