Chubarov, M. and Pedersen, H. and Högberg, H. and Henry, A. and Czigány, Zsolt (2015) Initial stages of growth and the influence of temperature during chemical vapor deposition of sp2-BN films. JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A-VACUUM SURFACES AND FILMS, 33 (6). 061520. ISSN 0734-2101
|
Text
JVSTA332015061520_Chubarov_u.pdf Download (1MB) | Preview |
Abstract
Knowledge of the structural evolution of thin films, starting by the initial stages of growth, is important to control the quality and properties of the film. The authors present a study on the initial stages of growth and the temperature influence on the structural evolution of sp2 hybridized boron nitride (BN) thin films during chemical vapor deposition (CVD) with triethyl boron and ammonia as precursors. Nucleation of hexagonal BN (h-BN) occurs at 1200 °C on α-Al2O3 with an AlN buffer layer (AlN/α-Al2O3). At 1500 °C, h-BN grows with a layer-by-layer growth mode on AlN/α-Al2O3 up to ∼4 nm after which the film structure changes to rhombohedral BN (r-BN). Then, r-BN growth proceeds with a mixed layer-by-layer and island growth mode. h-BN does not grow on 6H-SiC substrates; instead, r-BN nucleates and grows directly with a mixed layer-by-layer and island growth mode. These differences may be caused by differences in substrate surface temperature due to different thermal conductivities of the substrate materials. These results add to the understanding of the growth process of sp2-BN employing CVD. © 2015 American Vacuum Society.
Item Type: | Article |
---|---|
Uncontrolled Keywords: | Vapor deposition; Temperature influence; Substrate surface temperature; Substrate material; STRUCTURAL EVOLUTION; Layer-by-layer growth; Island growth mode; Chemical vapor depositions (CVD); AlN buffer layers; thin films; thermal conductivity; Substrates; silicon carbide; FILM GROWTH; DEPOSITION; Chemical vapor deposition; Boron Nitride; Atmospheric temperature; ALUMINUM NITRIDE; ALUMINUM |
Subjects: | Q Science / természettudomány > QC Physics / fizika Q Science / természettudomány > QD Chemistry / kémia |
SWORD Depositor: | MTMT SWORD |
Depositing User: | MTMT SWORD |
Date Deposited: | 26 Nov 2015 12:30 |
Last Modified: | 26 Nov 2015 12:30 |
URI: | http://real.mtak.hu/id/eprint/30405 |
Actions (login required)
![]() |
Edit Item |