Optical characterization of patterned thin films

Rosu, D. and Petrik, Péter and Rattmann, G. and Schellenberger, M. and Beck, U. (2014) Optical characterization of patterned thin films. THIN SOLID FILMS, 571 (P3). pp. 601-604. ISSN 0040-6090

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Abstract

The present study investigates the use of imaging and mapping ellipsometry to determine the properties of non- ideal and patterned thin fi lm samples. Samples which are candidates for future references and standards were prepared for this purpose. The samples investigated were lithographically patterned SiO 2 and photoresist layers. The thickness andtheopticalconstants of the twomaterials were determined usingspectroscopicellipsometryin the visible spectral range. On a larger lateral scale of several mm lateral resolution, the homogeneity was investigated using a goniospectral rotating compensator ellipsometer. A nulling imaging ellipsometer was used to determine the properties of the sample on a smaller scale of 25 – 150 μ m.

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