Lohner, Tivadar and Serényi, Miklós and Szilágyi, Edit and Zolnai, Zsolt and Czigány, Zsolt and Nguyen Quoc, Khánh and Petrik, Péter and Fried, Miklós (2016) Spectroellipsometric detection of silicon substrate damage caused by radiofrequency sputtering of niobium oxide. APPLIED SURFACE SCIENCE. pp. 1-30. ISSN 0169-4332
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Spectroellipsometric_1_s2.0_S0169433216326903_main_u.pdf Restricted to Repository staff only Download (875kB) | Request a copy |
Official URL: http://dx.doi.org/10.1016/j.apsusc.2016.11.232
Item Type: | Article |
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Uncontrolled Keywords: | electron microscopy; RUTHERFORD BACKSCATTERING; Ellipsometry; DAMAGE; sputtering |
Subjects: | Q Science / természettudomány > QC Physics / fizika Q Science / természettudomány > QD Chemistry / kémia > QD02 Physical chemistry / fizikai kémia |
SWORD Depositor: | MTMT SWORD |
Depositing User: | MTMT SWORD |
Date Deposited: | 01 Dec 2016 09:18 |
Last Modified: | 01 Dec 2016 09:18 |
URI: | http://real.mtak.hu/id/eprint/42657 |
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