Szívós, János and Serényi, Miklós and Pothorszky, Szilárd László and Deák, András and Vértesy, Gábor and Sáfrán, György (2017) A technique for nanopatterning diverse materials. SURFACE AND COATINGS TECHNOLOGY, 313. pp. 115-120. ISSN 0257-8972
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Abstract
A fast and high throughput technique has been proposed for the preparation of ordered nanopatterns. A self-organized monolayer of silica nanospheres (Langmuir-Blodgett film) is laid on and its hexagonal pattern is transferred to the sample surface by means of RF plasma etching. The technique was developed with the aim to fabricate nanopatterns onto surfaces or thin films of diverse materials. It is a fast, low cost, environmentally sound technique for the fabrication of hexagonal patterns of feature size down to a few ten nanometers. The mechanism and the parameters of RF plasma patterning affecting the nanostructure formation were revealed in sputter deposited Pt layers by means of scanning and transmission electron microscopy techniques. Moreover, the versatility of the proposed method is demonstrated by fabricating hexagonal patterns in samples of various metals, semiconductors, and insulators. © 2017 Elsevier B.V.
Item Type: | Article |
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Uncontrolled Keywords: | Langmuir Blodgett films; Silica nanospheres; Scanning and transmission electron microscopy; Nanostructure formation; High-throughput technique; Hexagonal pattern; Diverse materials; Wave plasma interactions; transmission electron microscopy; Thin film transistors; scanning electron microscopy; Plasma theory; Plasma etching; Nanostructures; High resolution transmission electron microscopy; FILMS; thin films; RF plasma etching; Ordered nanostructures; Nanopatterning; Langmuir-Blodgett film |
Subjects: | Q Science / természettudomány > QC Physics / fizika |
SWORD Depositor: | MTMT SWORD |
Depositing User: | MTMT SWORD |
Date Deposited: | 23 Feb 2017 07:35 |
Last Modified: | 23 Feb 2017 07:35 |
URI: | http://real.mtak.hu/id/eprint/49658 |
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