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Barrier inhomogeneity in vertical Schottky diodes on free standing gallium nitride

Roccaforte, F. and Giannazzo, F. and Alberti, Á. and Spera, M. and Cannas, M. and Cora, I. and Pécz, B. and Iucolano, F. and Greco, G. (2019) Barrier inhomogeneity in vertical Schottky diodes on free standing gallium nitride. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 94. pp. 164-170. ISSN 1369-8001

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Abstract

In this paper, the electrical behavior of a Ni/Au Schottky barrier on free standing GaN has been studied employing a variety of techniques and correlated with the material and interface quality. The temperature dependence of the ideality factor (n) and of the Schottky barrier height (ΦB) revealed a spatial inhomogeneity of the barrier. This behavior has been described by means of the Tung's model on inhomogeneous Schottky barriers. The origin of the barrier inhomogeneity can be likely associated to the surface quality of the GaN epilayer or to microstructure of the Ni/GaN interface.

Item Type: Article
Uncontrolled Keywords: Schottky barrier; Free standing GaN; Barrier spatial inhomogeneity; Ni/GaN interface;
Subjects: Q Science / természettudomány > QC Physics / fizika > QC05 Physical nature of matter / részecskefizika
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 12 Feb 2019 10:18
Last Modified: 12 Feb 2019 10:18
URI: http://real.mtak.hu/id/eprint/91251

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