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On the fabrication parameters of buried microchannels integrated in in-plane silicon microprobes.

Fekete, Zoltán and Pongrácz, Anita and Márton, Gergely and Fürjes, Péter (2013) On the fabrication parameters of buried microchannels integrated in in-plane silicon microprobes. MATERIALS SCIENCE FORUM, 729. pp. 210-215. ISSN 0255-5476

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Abstract

This paper aims the characterization of buried microchannels in silicon realized by deep reactive ion etching. The effects of dry etching parameters on the integrability into hollow microprobes are thoroughly investigated from both technological and functional aspects. Results are supposed to give physiology related probe designers a deeper insight into microfabrication-related issues.

Item Type: Article
Uncontrolled Keywords: buried microchannel, microfluidics, hollow microprobes, deep reactive ion etching
Subjects: T Technology / alkalmazott, műszaki tudományok > T2 Technology (General) / műszaki tudományok általában
Depositing User: Andrea Bolgár
Date Deposited: 17 May 2013 07:56
Last Modified: 17 May 2013 07:56
URI: http://real.mtak.hu/id/eprint/4913

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