Features of electronic transport in relaxed Si/Si1-XGeX heterostructures with high doping level

Orlov, Lev K. and Mel’nikova, A.A. and Orlov, Mikhail L. and Alyabina, Natal’ya A. and Ivina, Natal’ya L. and Neverov, V.N. and Horváth, Zsolt József (2013) Features of electronic transport in relaxed Si/Si1-XGeX heterostructures with high doping level. In: XXI International Materials Research Congress, Symposium 6B, Low-Dimensional Semiconductor Structures. Materials Research Society, Pittsburgh.

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The low-temperature electrical and magnetotransport characteristics of partially relaxed Si/Si1-xGex heterostructures with two-dimensional electron channel (ne ≥ 1012 cm-2) in an elastically strained silicon layer of nanometer thickness have been studied. The detailed calculation of the potential and the electron distribution in layers of the structure was carried out to understand the observed phenomena. The dependence of tunneling transparency of the barrier separating the 2D and 3D transport channels in the structure was studied as a function of the doping level, the degree of blurring boundaries, layer thickness, and degree of relaxation of elastic stresses in layers of the structure. Tunnel characteristics of the barrier between the layers were manifested by the appearance of a tunneling component in the current-voltage characteristics of real structures. Instabilities, manifested during the magnetotransport measurements using both weak and strong magnetic fields are explained by the transitions of charge carriers from the two-dimensional into three-dimensional state, due to interlayer tunneling transitions of electrons.

Item Type: Book Section
Uncontrolled Keywords: electrical properties;Si;nanostructure
Subjects: T Technology / alkalmazott, műszaki tudományok > T2 Technology (General) / műszaki tudományok általában
Depositing User: Andrea Bolgár
Date Deposited: 17 Jan 2014 18:44
Last Modified: 23 Jan 2014 09:47

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