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Investigation of the RF Sputtering Process and the Properties of Deposited Silicon Oxynitride Layers Under Varying Reactive Gas Conditions

Hegedüs, Nikolett and Balázsi, Csaba and Kolonits, Tamás and Olasz, Dániel and Sáfrán, György and Serényi, Miklós and Balázsi, Katalin (2022) Investigation of the RF Sputtering Process and the Properties of Deposited Silicon Oxynitride Layers Under Varying Reactive Gas Conditions. MATERIALS, 15 (18). pp. 1-14. ISSN 1996-1944

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Item Type: Article
Subjects: T Technology / alkalmazott, műszaki tudományok > TP Chemical technology / vegyipar, vegyészeti technológia
SWORD Depositor: MTMT SWORD
Depositing User: MTMT SWORD
Date Deposited: 13 Sep 2022 09:14
Last Modified: 13 Sep 2022 09:14
URI: http://real.mtak.hu/id/eprint/148456

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