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Effect of staged methane flow on morphology and growth rate of graphene monolayer domains by low-pressure chemical vapor deposition

Yan, Hui and Yang, Huiqi and Lin, Sai and He, Yinbo and Kiss, László and Kunsági-Máté, Sándor and Zhang, Meng and Li, Heng (2021) Effect of staged methane flow on morphology and growth rate of graphene monolayer domains by low-pressure chemical vapor deposition. THIN SOLID FILMS, 736. No. 138921. ISSN 0040-6090

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Abstract

Although many efforts have been spent on graphene growth, there is still a lack of comprehensive understanding about the growth mechanism and precise control for different morphologies of graphene domains synthesis though carbon precursor. In this work, controlled single-crystal graphene monolayer domains with different morphologies of four, six and multiple symmetry have been achieved just by staged modulation of methane flow through low-pressure chemical vapor deposition method on copper. The growth rate can also be regulated by the methane flow, and the highest growth rate can reach 25 μm/min corresponding to the multiple-dendritic shape. The schematic structure of the different shapes with active sites has been proposed to understand the formation mechanism of different graphene domains. Synthesis single crystal graphene with various morphologies will be of great promising potential applications in catalytic and many other felds.

Item Type: Article
Uncontrolled Keywords: Methane flow, Graphene domains, Morphology, Growth rate, Low-pressure chemical vapor deposition
Subjects: Q Science / természettudomány > QD Chemistry / kémia
Q Science / természettudomány > QD Chemistry / kémia > QD02 Physical chemistry / fizikai kémia
Depositing User: Dr. Tamás Kálai
Date Deposited: 19 Sep 2022 08:03
Last Modified: 19 Sep 2022 08:03
URI: http://real.mtak.hu/id/eprint/148895

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