Direct laser deposition of nanostructured tungsten oxide for sensing applications

Palla-Papavlu, Alexandra and Filipescu, Mihaela and Schneider, Christof W. and Antohe, Stefan and Ossi, Paolo Maria and Radnóczi, György (2016) Direct laser deposition of nanostructured tungsten oxide for sensing applications. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 49 (20). pp. 1-9. ISSN 0022-3727

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Abstract

Nanostructured tungsten trioxide (WO 3 ) thin films are deposited by pulsed laser deposition (PLD) and radio-frequency (RF) assisted PLD onto interdigitated sensor structures. Structural characterization by x-ray diffraction and Raman spectroscopy shows the WO 3 films are polycrystalline, with a pure monoclinic phase for the PLD grown films. The as-fabricated WO 3 sensors are tested for ammonia (NH 3 ) detection, by measuring the electrical response to NH 3 at different temperatures. Sensors based on WO 3 deposited by RF-PLD do not show any response to NH 3 . In contrast, sensors fabricated by PLD operating at 100 °C and 200 °C show a slow recovery time whilst at 300 °C, these sensors are highly sensitive in the low ppm range with a recovery time in the range of a few seconds. The microstructure of the films is suggested to explain their excellent electrical response. Columnar WO 3 thin films are obtained by both deposition methods. However, the WO 3 films grown by PLD are porous, (which may allow NH 3 molecules to diffuse through the film) whereas RF-PLD films are dense. Our results highlight that WO 3 thin films deposited by PLD can be applied for the fabrication of gas sensors with a performance level required for industrial applications.

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