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ZnO layers deposited by Atomic Layer Deposition

Pécz, Béla and Baji, Zsófia and Lábadi, Zoltán and Kovács, András (2013) ZnO layers deposited by Atomic Layer Deposition. JOURNAL OF PHYSICS-CONFERENCE SERIES, 471 (1). ISSN 1742-6588

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Abstract

The structure of 40 nm thick epitaxial ZnO layers grown on single crystalline sapphire and GaN substrates by atomic layer deposition has been studied using transmission electron microscopy. The growth is carried out between 150°C and 300°C without any buffer layer using di-ethyl zinc and water precursors. The ZnO layer on sapphire is found to be polycrystalline, which is probably due to the large misfit (~15 %) and the relatively low deposition temperature. However, the small misfit (~1.8 %) between the ZnO layer that is deposited on GaN at 300°C resulted in a high quality single crystalline layer.

Item Type: Article
Subjects: T Technology / alkalmazott, műszaki tudományok > T2 Technology (General) / műszaki tudományok általában
Depositing User: Andrea Bolgár
Date Deposited: 03 Dec 2013 13:57
Last Modified: 03 Dec 2013 15:05
URI: http://real.mtak.hu/id/eprint/7745

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