Items where Author is "Masheyeva, Ranna"

Article

Beckfeld, Florian and Masheyeva, Ranna and Derzsi, Aranka and Schulenberg, David and Korolov, Ihor and Bock, Claudia and Schulze, Julian and Donkó, Zoltán (2025) Effective secondary electron yields for different surface materials in capacitively coupled plasmas. PLASMA SOURCES SCIENCE AND TECHNOLOGY, 34. No. 035009. ISSN 0963-0252 (print); 1361-6595 (online)

Luo, Lan-Yue and Donkó, Zoltán and Masheyeva, Ranna and Vass, Máté and Li, He-Ping and Hartmann, Péter (2025) The quenching effect of oxygen addition on an argon capacitively coupled plasma: experimental and computational study of the argon metastable atom kinetics. PLASMA SOURCES SCIENCE AND TECHNOLOGY, 34. No. 015009. ISSN 0963-0252 (print); 1361-6595 (online)

Masheyeva, Ranna and Vass, Máté and Wang, Xiao-Kun and Liu, Yong-Xin and Derzsi, Aranka and Hartmann, Peter and Schulze, Julian and Donkó, Zoltán (2024) Electron power absorption in CF4 capacitively coupled RF plasmas operated in the striation mode. PLASMA SOURCES SCIENCE AND TECHNOLOGY, 33 (4). 045019. ISSN 0963-0252 (print); 1361-6595 (online)

Derzsi, Aranka and Vass, Máté and Masheyeva, Ranna and Horváth, Benedek and Donkó, Zoltán and Hartmann, Péter (2024) Frequency-dependent electron power absorption mode transitions in capacitively coupled argon-oxygen plasmas. PLASMA SOURCES SCIENCE AND TECHNOLOGY, 33 (2). No.-025005. ISSN 0963-0252 (print); 1361-6595 (online)

Wang, Xiao-Kun and Masheyeva, Ranna and Liu, Yong-Xin and Song, Yuan-Hong and Hartmann, Péter and Donkó, Zoltán and Schulze, Julian (2024) Energy efficient F atom generation and control in CF4 capacitively coupled plasmas driven by tailored voltage waveforms. PLASMA SOURCES SCIENCE AND TECHNOLOGY, 33. No. 085006. ISSN 0963-0252 (print); 1361-6595 (online)

Wang, Xiao-Kun and Korolov, Ihor and Wilczek, Sebastian and Masheyeva, Ranna and Liu, Yong-Xin and Song, Yuan-Hong and Hartmann, Péter and Donkó, Zoltán and Schulze, Julian (2024) Hysteresis in radio frequency capacitively coupled CF4 plasmas. PLASMA SOURCES SCIENCE AND TECHNOLOGY, 33. No. 085001. ISSN 0963-0252 (print); 1361-6595 (online)

Wang, Xiao-Kun and Masheyeva, Ranna and Liu, Yong-Xin and Hartmann, Péter and Schulze, Julian and Donkó, Zoltán (2023) The electrical asymmetry effect in electronegative CF4 capacitive RF plasmas operated in the striation mode. PLASMA SOURCES SCIENCE AND TECHNOLOGY, 32. 085009. ISSN 0963-0252 (print); 1361-6595 (online)

Masheyeva, Ranna and Dzhumagulova, Karlygash N. and Myrzaly, Murat and Schulze, Julian and Donkó, Zoltán (2021) Self-bias voltage formation and charged particle dynamics in multi-frequency capacitively coupled plasmas. AIP ADVANCES, 11. No. 075024. ISSN 2158-3226